Source Mask Optimization Technique Improves Extreme UV Lithography - IDEX Health & ScienceIDEX Health & Science


    The views, information, or opinions expressed in the Industry News RSS feed belong solely to the author and do not necessarily represent those of IDEX Health & Science and its employees.

    Source Mask Optimization Technique Improves Extreme UV Lithography

    Article obtained from Photonics RSS Feed.

    Researchers from the Shanghai Institute of Optics and Fine Mechanics of the Chinese Academy of Sciences proposed a source mask optimization (SMO) technique for extreme-ultraviolet lithography (EUVL) based on a thick mask model and a social learning particle swarm optimization (SL-PSO) algorithm.

    Simulations of the method suggested that the technique is more effective than similar approaches based on heuristic algorithms in optimization efficiency.

    With the continuous shrinking of the critical dimension of integrated circuits, the researchers said, precision and optimal performance requirements have become more stringent. Computational lithography improves performance without changing the hardware or software configurations of…

    Mar, 04 2021 |

    IDEX Health & Science is the global authority in fluidics and optics, bringing to life advanced optofluidic technologies with our products, people, and engineering expertise. Intelligent solutions for life.