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Article obtained from Photonics RSS Feed.
EV Group (EVG) has partnered with SCHOTT to demonstrate the readiness of 300-mm nanoimprint lithography (NIL) for high-volume patterning of high-refractive index glass wafers used in the manufacture of waveguides/light guides for next-generation augmented/mixed reality headsets.
The partnership combines EVG’s proprietary SmartNIL process and SCHOTT RealView high-refractive index glass wafers, and will be carried out in EVG’s Austrian facility. SCHOTT will showcase the technology at the China International Optoelectronic Expo (CIOE), to be held Sept. 4-7.
The use of NIL to pattern glass substrates with structures for photonics applications has been limited to 200-mm substrates. This past June, EVG introduced the…READ MORE