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Physicists from RIKEN have taken a step to enhance semiconductor performance, developing a single-crystal thin film of cuprous iodide. The film is atomically flat and free of any defects.
Conventional approaches for fabricating thin films of cuprous iodide without any impurities typically necessitate depositing the film from a solution. Using cuprous iodide, however, which is a halide compound and a highly effective conductor and is stable above room temperature, a solution-based process is unable to generate a high-quality thin film.
A team led Masao Nakamura from the RIKEN Center for Emergent Matter Science instead used molecular beam epitaxy. In the technique, a film is grown on top of a substrate, in a vacuum, and at an…READ MORE