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A joint effort from HyperLight and Harvard University has achieved a technical milestone for lithium niobate photonic integrated circuits (PICs). The work demonstrates lithium niobate PICs’ compatibility with mass production technologies. The technology aims to alleviate bottlenecks in data center and telecommunications networks while minimizing energy consumption.
The team achieved fabrication on 4- and 6-in. wafers and used deep ultraviolet lithography and smooth and uniform etching to realize 0.27 dB/cm optical propagation loss on wafer scale, allowing efficient light guiding.
According to Kevin Luke, the research paper lead author and head of manufacturing at HyperLight, the devices are not limited to high-end applications,…READ MORE